募捐 9月15日2024 – 10月1日2024 关于筹款

Characterization in Silicon Processing

Characterization in Silicon Processing

Strausser, Yale
你有多喜欢这本书?
下载文件的质量如何?
下载该书,以评价其质量
下载文件的质量如何?
This book reviews techniques by which silicon processing engineers working with semiconductors can meet the demands for improved material quality and performance made necessary by increasingly stringent requirements, such as decreasing barrier film thicknesses. Among the techniques described are monitoring the effectiveness of surface cleaning processes; determining the amount of silicon consumption during barrier film and silicide growth; and silicon selective epitaxial growth.
种类:
年:
1993
出版社:
Elsevier
语言:
english
页:
240
ISBN 10:
0750691727
ISBN 13:
9780750691727
文件:
PDF, 10.78 MB
IPFS:
CID , CID Blake2b
english, 1993
线上阅读
正在转换
转换为 失败

关键词