Spacer engineered FinFET architectures : high-performance digital circuit applications
Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
年:
2017
出版:
1
出版社:
CRC Press
语言:
english
页:
138
ISBN 10:
1498783597
ISBN 13:
9781498783590
文件:
PDF, 4.38 MB
IPFS:
,
english, 2017