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Optical Lithography: Here is Why (SPIE Press Monograph Vol. PM190)
Burn J. Lin你有多喜欢这本书?
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This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. Topics include:- Exposure Systems- Image Formation- The Meter of Lithography- Components in Optical Lithography- Processing and Optimization- Immersion Lithography- Outlook for optical lithography
种类:
年:
2009
出版社:
SPIE Publications
语言:
english
页:
493
ISBN 10:
0819475602
ISBN 13:
9780819475602
系列:
SPIE Press Monograph PM190
文件:
PDF, 29.27 MB
您的标签:
IPFS:
CID , CID Blake2b
english, 2009
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